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KDDI and Altair Demonstrate Cellular LPWA for IoT

By Ken Briodagh January 17, 2017

Altair Semiconductor, a provider of LTE chipsets, has announced a partnership with KDDI in Japan to demo CAT-M new Release 13 and ultra-low-power consumption, using LTE extended discontinuous reception (eDRX) and power saving mode (PSM) settings.

“Cellular LPWA technologies are key enablers for the proliferation of IoT applications and use cases,” said Hiroshi Tsuji, GM, Product and Device Technology Department, KDDI. “We at KDDI have a longstanding partnership with Altair, which started with CAT-4, extended to CAT-1 and is now focused on Cellular LPWA technologies. Altair's ultra-low power consumption architecture and early market leadership are very valuable for KDDI in realizing the IoT vision.”

Demonstrations such as the ones these partners have done help to illustrate real-world cases for CAT-M technologies, especially the battery life improvements.

“Long battery life is a very important feature for many IoT use cases,” said Eran Eshed, Co-founder and VP, Worldwide Sales and Marketing, Altair. “Altair's chipset solutions set the industry benchmark for ultra-low power consumption. We are excited to cooperate with a leading carrier such as KDDI in an effort to commercialize this unique capability for the benefit of users and organizations in Japan and worldwide.”

PSM, as specified by 3GPP Release 12, is designed to allow devices to connect to the network only as needed, preserving battery life by remaining in sleep mode. Similarly, eDRX functionality, part of the new Release 13 standard, enables further power improvement by allowing IoT devices to remain inactive for long periods, yet remain registered and accessible for network-initiated communication. This reduces the amount of power required and extends battery life significantly.

Worries about limited battery life are a major challenge still keeping some companies from adopting IoT solutions, and such proofs as this one are an important step to showing the benefits of implantation. 




Edited by Alicia Young
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